The anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature by dc reactive magnetron sputtering technique. The nanorods are highly ordered and are perpendicular to the substrate. XRD measurements show that the anatase nanorods have a preferred orientation along the [110] direction. The prepared nanorods were annealed at different temperatures (200 ºC – 500 ºC) in air for...
For the first time, the TiO2 nanorod arrays have been prepared on ITO substrates at room temperature by dc reactive magnetron sputtering technique. These TiO2 nanorods have a preferred orientation along the (220) direction and are perpendicular to the ITO substrate. Both the X-ray diffraction and Raman scattering measurements show that the highly ordered TiO2 nanorod arrays have an anatase crystal structure. Th...
Three different thickness dense TiO2 (150 nm, 300 nm and 450 nm respectively) films were deposited on ITO substrates by dc reactive magnetron sputtering technique. These dense TiO2 films were used as the blocking layers. After that, TiO2 nanorod films were deposited on these dense TiO2 films by same technique. Both the dense and nanorod TiO2 films have an anatase phase. The dense TiO2 films have an orientation ...
The TiO2 nanorod arrays, with about 1.8 μm lengths, have been deposited on ITO substrates by dc reactive magnetron sputtering at different target-substrate distances. The average diameter of these nanorods can be modified from about 45 nm to 85 nm by adjusting the target-substrate distance from 90 mm to 50 mm. These nanorods are highly ordered and perpendicular to the substrate. Both XRD and Raman measurements ...