Sensors based on the Local Surface plasmon Resonance (LSPR) are attractive due to their simple structure and good sensitivity, but the expensive optoelectronic part of the device is limiting the practical applications. There is a need for new strategies to bring the excellent detection properties of LSPR sensors to the playground of low-cost devices and materials. In this work, it is proposed a novel approach t...
This work reports on undoped and Sn-doped indium sulfofluoride thin-films deposited by radio-frequency plasma-enhanced reactive thermal evaporation. The deposition was performed evaporating pure indium or indium-tin alloy in SF6 plasma at substrate temperatures ranging from 373 to 423 K. Rutherford backscattering analysis and secondary-ion mass spectrometry were used to determine the chemical composition of the...
Combination of carbon-based nanomaterials (CNMs) with AuNPs has been demonstrated to enhance the LSPR response and facilitate the functionalization with specific and selective antibodies. Also, the introduction of CNMs in the plasmonic layer allows tuning of the LSPR central frequency. Joining the double dependence of the LSPR on the MNPs size and the presence of CNMs, it is possible to create a set of plasmoni...
Indium sulfofluoride is an amorphous wide-gap semiconductor exhibiting high sensitivity to UV radiation. This work reports on the kinetics of photoconductivity in indium sulfofluoride thin films along with their electrical and optical properties. The films were deposited by radio-frequency plasma-enhanced reactive thermal evaporation. The film characterization includes electrical, optical, and photoconductivity...
In this contribution we report on a low cost plasmonic electrode for light-sensing applications. The electrode combines a conducting nonstoichiometric indium oxide (InOx) layer with an ultrathin (~5 nm) discontinuous Au layer. The InOx and Au layers were deposited on glass substrates by plasma enhanced reactive thermal evaporation and thermal evaporation, respectively. Several device configurations with one or ...
This work reports on low temperature deposition of conducing indium oxide films by a radio-frequency plasma enhanced reactive thermal evaporation (rf-PERTE) technique. The films were deposited on polyethylene terephthalate (PET) without intentional heating of the substrate and at elevated temperatures up to 150 degrees C. The material stoichiometry was accurately controlled by adjusting deposition conditions in...
This work reports on transparent semiconducting indium sulfide fluoride (ISF) thin-films exhibiting high sensitivity to ultraviolet radiation. The films were deposited on fused silica and silicon substrates using a radiofrequency plasma-enhanced reactive thermal evaporation system. The deposition was performed evaporating pure indium in SF6 plasma at a substrate temperature of 423 K. Rutherford backscattering m...
This paper reports about a study of the local plasmonic resonance (LSPR) produced by metal nanoparticles embedded in a dielectric or semiconductor matrix. It is presented an analysis of the LSPR for different nanoparticle metals, shapes, and embedding media composition. Metals of interest for nanoparticle composition are Aluminum and Gold. Shapes of interest are nanospheres and nanotriangles. We study in this w...
The large majority of surface plasmon resonance based devices use noble metals, namely gold or silver, in their manufacturing process. These metals present low resistivity, which leads to low optical losses in the visible and near infrared spectrum ranges. Gold shows high environmental stability, which is essential for long-term operation, and silver's lower stability can be overcome through the deposition of a...
Localized surface plasmons (LSP) can be excited in metal nanoparticles (NP) by UV, visible or NIR light and are described as coherent oscillation of conduction electrons. Taking advantage of the tunable optical properties of NPs, we propose the realization of a plasmonic structure, based on the LSP interaction of NP with an embedding matrix of amorphous silicon. This study is directed to define the characterist...