4 documents found, page 1 of 1
Dielectric UV filters for protection of fire-resistant glass based on intumesce...
Silva, Ricardo Magno Lopes; Hashim, Hurraira; Roy, Deepto; Oliveira Fernandes, Carolina; Oliveira, Kevin; Leitão Pinheiro, Xavier AlexandreABSTRACT: Structures such as OLEDs, perovskite solar cells, intumescent glasses, and other components in modern devices and buildings contain materials suscep-tible to degradation when exposed to UV radiation, requiring protection to with-stand outdoor environmental conditions. In this work, multilayer coating config-ured as a Bragg Reflector on glass is employed as spectral filtering to protect the intumescent...
Fire-resistant materials: characterization and thermal behavior of intumescent ...
Donato, Mariana; Esteves, M. Alexandra; Capelo, Anabela; Oliveira, Fernando; Ferreira, Cristina; Alves, Isabel N.; Morgado, Vanessa; Correia, Jose B.
Over 100 mV VOC improvement for rear passivated ACIGS ultra‐thin solar cells
Oliveira, Antonio; Rocha Curado, Marco; Teixeira, J. P.; Tomé, Daniela; Çaha, Ihsan; Oliveira, Kevin; Lopes, Tomás; Monteiro, Margarida; Violas, AndréA decentralized energy system requires photovoltaic solutions to meet new aesthetic paradigms, such as lightness, flexibility, and new form factors. Notwithstanding, the materials shortage in the Green Transition is a concern gaining momentum due to their foreseen continuous demand. A fruitful strategy to shrink the absorber thickness, meeting aesthetic and shortage materials consumption targets, arises from in...
Cu(In,Ga)Se2 based ultrathin solar cells: the pathway from lab rigid to large s...
Lopes, Tomás; Teixeira, Jennifer; Curado, Marco; Ferreira, Bernado; Oliveira, Antonio; Cunha, José; Monteiro, Margarida; Violas, André; Barbosa, JoãoFor the first time, the incorporation of interface passivation structures in ultrathin Cu(In,Ga)Se2 (CIGS) based solar cells is shown in a flexible lightweight stainless-steel substrate. The fabrication was based on an industry scalable lithography technique - nanoimprint lithography (NIL) - for a 15x15 cm2 dielectric layer patterning, needed to reduce optoelectronic losses at the rear interface. The nanopatter...