26 documents found, page 1 of 3

PEALD of SiNx using bis(diethylamino)silane (BDEAS) precursor with N2 plasma

Silicon nitride (SiNx) ultra-thin films are essential for semiconductor and photonic integrated circuit applications, particularly where low-temperature processing is required. This study investigated SiNx ultra-thin films deposited by plasma-enhanced atomic layer deposition (PEALD) using bis(diethylamino)silane (BDEAS) and N2 plasma, focusing on the effects of deposition parameters and plasma treatments on fil...

Quantum optics activities at MNFabLab-CMEMS-UMinho

[Introduction] In the Micro Nano Fabrication Laboratory (MNFabLab) at the Center for MicroElectroMechanical Systems (CMEMS) of the University of Minho (UMinho) operation at the atomic level is done with Atomic Layer Deposition (ALD) system, which offers both thermal and plasma options for depositing oxides and nitrides materials, essential for quantum optics applications [1].[...]

Quantum optics activities at MNFabLab-CMEMS-UMinho

This abstract shows the quantum optics activities at the Micro Nano Fabrication Laboratory (MNFabLab) at the Center for MicroElectroMechanical Systems (CMEMS) of the University of Minho (UMinho). In the MNFabLab operation at the atomic level is done with Atomic Layer Deposition (ALD) system, which offers both thermal and plasma options for depositing oxides and nitrides materials, essential for quantum optics a...

PEALD of SiNx using bis(diethylamino)silane (BDEAS) precursor with N2-plasma

An optical wireless communication system for physiological data transmission in...

In biomedical research, telemetry is used to take automated physiological measurements wirelessly from animals, as it reduces their stress and allows recordings for large data collection over long periods. The ability to transmit high-throughput data from an in-body device (e.g., implantable systems, endoscopic capsules) to external devices can also be achieved by radiofrequency (RF), a standard wireless commun...

Silicon Nitride ultra-thin films by Plasma-Enhanced ALD using BDEAS as precurso...

[Excerto] Silicon nitride (SiNx) ultra-thin films are essential for semiconductor and photonic integrated circuits (PIC) applications, particularly where a high refractive index and low-temperature processing are required. • The SiNx ultra-thin films were deposited by plasma- enhanced atomic layer deposition (PEALD) using bis(diethylamino)silane (BDEAS) and N2-plasma, and investigated with a focus on the impact...

Atomic Layer Deposition (ALD) principles, benefits, and applications

[Excerpt] The Atomic Layer Deposition (ALD) technique is a cyclic deposition technique based on the sequential purging of the precursors and co-reactants with self-limiting surface reactions. The ALD process grows ultra-thin films (< 20 nm) in two half-cycles, sub-monolayer by sub-monolayer (Figure 1). [...]

Silicon nitride thin-films deposited by radiofrequency reactive sputtering: ref...

Silicon nitride (SiN) is widely used as a core material in optical waveguides due to its optical properties. The deposition of SiN thin-films by radiofrequency (RF) reactive sputtering is commonly used in low-temperature processes, where the thin-films optical properties can be optimized by controlling the deposition parameters (sputtering power, gases ratio, etc.). This work presents the deposition of several ...

Deposição por camadas atómicas (ALD) Princípios, vantagens, e aplicações

[Excerto] A deposição por camadas atómicas (ALD) é uma técnica de deposição cíclica baseada na purga sequencial de percursores e de co-reagentes com reações auto-limitativas na superfície do substrato (Figura 1). Esta técnica permite uma deposição controlada ao nível atómico e o crescimento de filmes ultrafinos (< 20 nm). Esta técnica pertence á categoria da deposição química de vapor (CVD).

PDMS microlenses coating with a SiO2 ultra-thin film deposited by atomic layer ...

The optical characteristics of microlenses are significantly influenced by their surface roughness, which is determined by the fabrication process. High-surface roughness increases light scattering, reducing the optical efficiency of the microlenses. The atomic layer deposition (ALD) technique, known for its high conformity, can minimize the roughness of the substrate, filling the surface voids and smoothing it...