3 documents found, page 1 of 1
Coexistence of Universal and Topological Anomalous Hall Effects in Metal CrO2 T...
Branford, W. R.; Yates, Karen A.; Barkhoudarov, E.; Moore, J. D.; Morrison, K.; Magnus, F.; Miyoshi, Y.; Sousa, P. M.; Conde, O.The scaling exponent of 1.6 between anomalous Hall and longitudinal conductivity, characteristic of the universal Hall mechanism in dirty-metal ferromagnets, emerges from a series of CrO2 films as we systematically increase structural disorder. Magnetic disorder in CrO2 increases with temperature and this drives a separate topological Hall mechanism. We find that these terms are controlled discretely by structu...
The spin polarization of CrO2 revisited
Yates, Karen A.; Branford, W. R.; Magnus, F.; Miyoshi, Y.; Morris, B.; Cohen, L. F.; Sousa, P. M.; Conde, O.; Silvestre, António JorgeHere, we use Andreev reflection spectroscopy to study the spin polarization of high quality CrO2 films. We study the spin polarization as a function of growth temperature, resulting in grain size and electrical resistivity. In these films low temperature growth appears to be a necessary but not sufficient condition to guarantee the observation of high spin polarization, and this is only observed in conjunction ...
CVD of CrO(2): Towards a lower temperature deposition process
Sousa, Pedro M.; Dias, Sonia A.; Silvestre, António Jorge; Conde, Olinda; Morris, Benjamin; Yates, Karen A.; Branford, William R.; Cohen, Lesley F.The deposition of highly oriented a-axis CrO(2) films onto Al(2)O(3)(0001) by atmospheric pressure (AP)CVD at temperatures as low as 330 C is reported. Deposition rates strongly depend on the substrate temperature, whereas for film surface microstructures the dependence is mainly on film thickness. For the experimental conditions used in this work, CrO(2) growth kinetics are dominated by a surface reaction mech...