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The aim of this research work was to optimize the coating of tungsten wires with reactive multilayer thin films and promote an exothermic self-propagating reaction. The ultimate goal is to use this heat to liquify low melting temperature materials, and thus block crack propagation in metallic materials. Ni/Me (Me = Al, Ti) multilayers were deposited by a DC (direct current) magnetron sputtering onto tungsten wires with diameters of 0.05 and 0.20 mm. The depositions were carried out to obtain films with near equiatomic average chemical composition and a modulation period (bilayer thickness) between 20 and 50 nm. The cross-section of the films was analyzed using electron microscopy before and after electrical ignition. A new substrate holder was developed to improve the quality of the Al/Ni films, allowing a reduction in the defects previously observed. The Ni/Ti thin films showed no discernible defects, regardless of the substrate holder. However, after ignition, the Ni + Ti reaction occurred in a non-self-propagating mode. Passing an electric current through a wire (ϕ = 0.05 mm) coated with an Al/Ni thin film, promoted a flash of light that was associated with the start of a self-propagating reaction. The reaction product was a B2-AlNi intermetallic phase. W wires coated with reactive multilayers may contribute to crack filling, and have potential to be self-healing actuators.