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Properties changes of Ti(C, O, N) films prepared by PVD : the effect of reactive gases partial pressure

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Resumo:Dark Ti-C-O-N thin films were deposited by dc reactive magnetron sputtering. A titanium target was sputtered while three different gas flows were injected into the deposition chamber: argon (working gas), acetylene and a mixture of oxygen and nitrogen (reactive gases). The films were produced with variation of the gases flow rates, maintaining the remaining parameters constant. Varying the ratio between the reactive gases flow (gas mixture/acetylene) allowed obtaining films with different characteristics. The colour of the films was characterized by spectral reflectance spectroscopy, and expressed in the CIE 1976 L*a*b* colour space. An accurate control of the deposition conditions allowed obtaining intrinsic and stable dark colours for decorative applications. Composition analysis by electron probe microanalysis was done to quantify the elemental concentrations in the films. X-ray diffraction experiments revealed the evolution of the film structure which showed to be essentially amorphous, but with evidences of fcc structure.
Autores principais:Cunha, L.
Outros Autores:Moura, C.; Vaz, F.; Chappé, J. M.; Olteanu, C.; Munteanu, D.; Munteanu, A.
Assunto:Reactive sputtering Titanium oxycarbonitride Decorative properties
Ano:2009
País:Portugal
Tipo de documento:artigo
Tipo de acesso:acesso aberto
Instituição associada:Universidade do Minho
Idioma:inglês
Origem:RepositóriUM - Universidade do Minho

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