Publicação
AlNxOy thin films deposited by DC reactive magnetron sputtering
| Resumo: | AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resistivity of the coatings are strongly correlated with discharge parameters. Varying the reactive gas mixture partial pressure, the film properties change gradually from metallic-like films, for low reactive gas partial pressures, to stoichiometric amorphous Al2O3 insulator films, at high pressures. For intermediate reactive gas pressures, sub-stoichiometric AlN x O y films were obtained, with the electrical resistivity of the films increasing with the non metallic/metallic ratio. |
|---|---|
| Autores principais: | Borges, Joel Nuno Pinto |
| Outros Autores: | Vaz, F.; Marques, L. |
| Assunto: | Aluminium oxide Aluminium nitride DC magnetron Reactive sputtering Morphology Structure Electrical resistivity |
| Ano: | 2010 |
| País: | Portugal |
| Tipo de documento: | artigo |
| Tipo de acesso: | acesso aberto |
| Instituição associada: | Universidade do Minho |
| Idioma: | inglês |
| Origem: | RepositóriUM - Universidade do Minho |
| _version_ | 1867438209413152768 |
|---|---|
| author | Borges, Joel Nuno Pinto |
| author2 | Vaz, F. Marques, L. |
| author2_role | author author |
| author_facet | Borges, Joel Nuno Pinto Vaz, F. Marques, L. |
| author_role | author |
| contributor_name_str_mv | RepositóriUM - Universidade do Minho |
| country_str | PT |
| creators_json_txt | [{\"Person.name\":\"Borges, Joel Nuno Pinto\"},{\"Person.name\":\"Vaz, F.\"},{\"Person.name\":\"Marques, L.\"}] |
| datacite.contributors.contributor.contributorName.fl_str_mv | RepositóriUM - Universidade do Minho |
| datacite.creators.creator.creatorName.fl_str_mv | Borges, Joel Nuno Pinto Vaz, F. Marques, L. |
| datacite.date.Accepted.fl_str_mv | 2010-01-01T00:00:00Z |
| datacite.date.available.fl_str_mv | 2010-10-29T13:43:26Z |
| datacite.date.embargoed.fl_str_mv | 2010-10-29T13:43:26Z |
| datacite.rights.fl_str_mv | http://purl.org/coar/access_right/c_abf2 |
| datacite.subjects.subject.fl_str_mv | Aluminium oxide Aluminium nitride DC magnetron Reactive sputtering Morphology Structure Electrical resistivity |
| datacite.titles.title.fl_str_mv | AlNxOy thin films deposited by DC reactive magnetron sputtering |
| dc.contributor.none.fl_str_mv | RepositóriUM - Universidade do Minho |
| dc.creator.none.fl_str_mv | Borges, Joel Nuno Pinto Vaz, F. Marques, L. |
| dc.date.Accepted.fl_str_mv | 2010-01-01T00:00:00Z |
| dc.date.available.fl_str_mv | 2010-10-29T13:43:26Z |
| dc.date.embargoed.fl_str_mv | 2010-10-29T13:43:26Z |
| dc.format.none.fl_str_mv | application/pdf |
| dc.identifier.none.fl_str_mv | https://hdl.handle.net/1822/10981 |
| dc.language.none.fl_str_mv | eng |
| dc.publisher.none.fl_str_mv | Elsevier |
| dc.rights.none.fl_str_mv | http://purl.org/coar/access_right/c_abf2 |
| dc.subject.none.fl_str_mv | Aluminium oxide Aluminium nitride DC magnetron Reactive sputtering Morphology Structure Electrical resistivity |
| dc.title.fl_str_mv | AlNxOy thin films deposited by DC reactive magnetron sputtering |
| dc.type.none.fl_str_mv | http://purl.org/coar/resource_type/c_6501 |
| description | AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resistivity of the coatings are strongly correlated with discharge parameters. Varying the reactive gas mixture partial pressure, the film properties change gradually from metallic-like films, for low reactive gas partial pressures, to stoichiometric amorphous Al2O3 insulator films, at high pressures. For intermediate reactive gas pressures, sub-stoichiometric AlN x O y films were obtained, with the electrical resistivity of the films increasing with the non metallic/metallic ratio. |
| dirty | 0 |
| eu_rights_str_mv | openAccess |
| format | article |
| fulltext.url.fl_str_mv | https://repositorium.uminho.pt/bitstreams/5618d3f9-99b4-42d6-916d-429e3058312c/download |
| id | rum_f92d3ca0f2a6f44bc331f88924adf80a |
| identifier.url.fl_str_mv | https://hdl.handle.net/1822/10981 |
| instacron_str | repositorium |
| institution | Universidade do Minho |
| instname_str | Universidade do Minho |
| language | eng |
| network_acronym_str | rum |
| network_name_str | RepositóriUM - Universidade do Minho |
| oai_identifier_str | oai:repositorium.uminho.pt:1822/10981 |
| organization_str_mv | urn:organizationAcronym:repositorium |
| person_str_mv | Borges, Joel Nuno Pinto Vaz, F. Marques, L. |
| publishDate | 2010 |
| publisher.none.fl_str_mv | Elsevier |
| reponame_str | RepositóriUM - Universidade do Minho |
| repository_id_str | urn:repositoryAcronym:rum |
| service_str_mv | urn:repositoryAcronym:rum |
| spelling | engElsevierporAlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resistivity of the coatings are strongly correlated with discharge parameters. Varying the reactive gas mixture partial pressure, the film properties change gradually from metallic-like films, for low reactive gas partial pressures, to stoichiometric amorphous Al2O3 insulator films, at high pressures. For intermediate reactive gas pressures, sub-stoichiometric AlN x O y films were obtained, with the electrical resistivity of the films increasing with the non metallic/metallic ratio.application/pdfporAlNxOy thin films deposited by DC reactive magnetron sputteringBorges, Joel Nuno PintoVaz, F.Marques, L.HostingInstitutionOrganizationalRepositóriUM - Universidade do Minhoe-mailmailto:repositorium@usdb.uminho.ptrepositorium@usdb.uminho.ptCITATION"Applied Surface Science". ISSN 0169-4332. 257:5 (2010) 1478-1483.ISSNIsPartOf0169-4332DOIIsPartOf10.1016/j.apsusc.2010.08.0762010-10-29T13:43:26Z20102010-01-01T00:00:00ZHandlehttps://hdl.handle.net/1822/10981http://purl.org/coar/access_right/c_abf2open accessAluminium oxideAluminium nitrideDC magnetronReactive sputteringMorphologyStructureElectrical resistivity946263 bytesliteraturehttp://purl.org/coar/resource_type/c_6501journal articlehttp://purl.org/coar/access_right/c_abf2application/pdffulltexthttps://repositorium.uminho.pt/bitstreams/5618d3f9-99b4-42d6-916d-429e3058312c/download |
| spellingShingle | AlNxOy thin films deposited by DC reactive magnetron sputtering Borges, Joel Nuno Pinto Aluminium oxide Aluminium nitride DC magnetron Reactive sputtering Morphology Structure Electrical resistivity |
| status | SINGLETON |
| subject.fl_str_mv | Aluminium oxide Aluminium nitride DC magnetron Reactive sputtering Morphology Structure Electrical resistivity |
| title | AlNxOy thin films deposited by DC reactive magnetron sputtering |
| title_full | AlNxOy thin films deposited by DC reactive magnetron sputtering |
| title_fullStr | AlNxOy thin films deposited by DC reactive magnetron sputtering |
| title_full_unstemmed | AlNxOy thin films deposited by DC reactive magnetron sputtering |
| title_short | AlNxOy thin films deposited by DC reactive magnetron sputtering |
| title_sort | AlNxOy thin films deposited by DC reactive magnetron sputtering |
| topic | Aluminium oxide Aluminium nitride DC magnetron Reactive sputtering Morphology Structure Electrical resistivity |
| topic_facet | Aluminium oxide Aluminium nitride DC magnetron Reactive sputtering Morphology Structure Electrical resistivity |
| url | https://hdl.handle.net/1822/10981 |
| visible | 1 |