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Structure and optical properties of ZnO:V thin films with different doping concentration

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Resumo:A series of ZnO thin films doped with various vanadium concentrations were prepared on glass substrates by direct current reactive magnetron sputtering. The results of the X-ray diffraction (XRD) show that the films with doping concentration less than 10 at.% have a wurtzite structure and grow mainly along the c-axis orientation. The residual stress, estimated by fitting the XRD diffraction peaks, increases with the doping concentration and the grain size also has been calculated from the XRD results, decreases with increasing the doping concentration. The surface morphology of the ZnO:V thin films was examined by SEM. The optical constants (refractive index and extinction coefficient) and the film thickness have been obtained by fitting the transmittance. The optical band gap changed from 3.12 eV to 3.60 eV as doping concentration increased from 1.8 at.% to 13 at.% mol. All the results have been discussed in relation with doping concentration
Autores principais:Wang Li-Wei
Outros Autores:Meng Lijian; Teixeira, Vasco M. P.; Song Shigeng; Xu Zheng; Xu Xu-Rong
Assunto:V-doped ZnO Magnetron sputtering Optical properties
Ano:2009
País:Portugal
Tipo de documento:artigo
Tipo de acesso:acesso aberto
Instituição associada:Universidade do Minho
Idioma:inglês
Origem:RepositóriUM - Universidade do Minho
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author Wang Li-Wei
author2 Meng Lijian
Teixeira, Vasco M. P.
Song Shigeng
Xu Zheng
Xu Xu-Rong
author2_role author
author
author
author
author
author_facet Wang Li-Wei
Meng Lijian
Teixeira, Vasco M. P.
Song Shigeng
Xu Zheng
Xu Xu-Rong
author_role author
contributor_name_str_mv Universidade do Minho
country_str PT
creators_json_txt [{\"Person.name\":\"Wang Li-Wei\"},{\"Person.name\":\"Meng Lijian\"},{\"Person.name\":\"Teixeira, Vasco M. P.\"},{\"Person.name\":\"Song Shigeng\"},{\"Person.name\":\"Xu Zheng\"},{\"Person.name\":\"Xu Xu-Rong\"}]
datacite.contributors.contributor.contributorName.fl_str_mv Universidade do Minho
datacite.creators.creator.creatorName.fl_str_mv Wang Li-Wei
Meng Lijian
Teixeira, Vasco M. P.
Song Shigeng
Xu Zheng
Xu Xu-Rong
datacite.date.Accepted.fl_str_mv 2009-05-01T00:00:00Z
datacite.date.available.fl_str_mv 2011-09-19T13:43:30Z
datacite.date.embargoed.fl_str_mv 2011-09-19T13:43:30Z
datacite.rights.fl_str_mv http://purl.org/coar/access_right/c_abf2
datacite.subjects.subject.fl_str_mv V-doped ZnO
Magnetron sputtering
Optical properties
datacite.titles.title.fl_str_mv Structure and optical properties of ZnO:V thin films with different doping concentration
dc.contributor.none.fl_str_mv Universidade do Minho
dc.creator.none.fl_str_mv Wang Li-Wei
Meng Lijian
Teixeira, Vasco M. P.
Song Shigeng
Xu Zheng
Xu Xu-Rong
dc.date.Accepted.fl_str_mv 2009-05-01T00:00:00Z
dc.date.available.fl_str_mv 2011-09-19T13:43:30Z
dc.date.embargoed.fl_str_mv 2011-09-19T13:43:30Z
dc.format.none.fl_str_mv application/pdf
dc.identifier.none.fl_str_mv https://hdl.handle.net/1822/13627
dc.language.none.fl_str_mv eng
dc.publisher.none.fl_str_mv Elsevier
dc.rights.none.fl_str_mv http://purl.org/coar/access_right/c_abf2
dc.subject.none.fl_str_mv V-doped ZnO
Magnetron sputtering
Optical properties
dc.title.fl_str_mv Structure and optical properties of ZnO:V thin films with different doping concentration
dc.type.none.fl_str_mv http://purl.org/coar/resource_type/c_6501
description A series of ZnO thin films doped with various vanadium concentrations were prepared on glass substrates by direct current reactive magnetron sputtering. The results of the X-ray diffraction (XRD) show that the films with doping concentration less than 10 at.% have a wurtzite structure and grow mainly along the c-axis orientation. The residual stress, estimated by fitting the XRD diffraction peaks, increases with the doping concentration and the grain size also has been calculated from the XRD results, decreases with increasing the doping concentration. The surface morphology of the ZnO:V thin films was examined by SEM. The optical constants (refractive index and extinction coefficient) and the film thickness have been obtained by fitting the transmittance. The optical band gap changed from 3.12 eV to 3.60 eV as doping concentration increased from 1.8 at.% to 13 at.% mol. All the results have been discussed in relation with doping concentration
dirty 0
eu_rights_str_mv openAccess
format article
fulltext.url.fl_str_mv https://prod-dspace.uminho.pt/bitstreams/0548ef8e-8bfb-4a39-b7dd-7692423f2dee/download
id rum_e3d4f4172d54eaeebf8a411ad2fc94fe
identifier.url.fl_str_mv https://hdl.handle.net/1822/13627
instacron_str repositorium
institution Universidade do Minho
instname_str Universidade do Minho
language eng
network_acronym_str rum
network_name_str RepositóriUM - Universidade do Minho
oai_identifier_str oai:repositorium.uminho.pt:1822/13627
organization_str_mv urn:organizationAcronym:repositorium
person_str_mv Wang Li-Wei
Meng Lijian
Teixeira, Vasco M. P.
Song Shigeng
Xu Zheng
Xu Xu-Rong
publishDate 2009
publisher.none.fl_str_mv Elsevier
reponame_str RepositóriUM - Universidade do Minho
repository_id_str urn:repositoryAcronym:rum
service_str_mv urn:repositoryAcronym:rum
spelling engElsevierporA series of ZnO thin films doped with various vanadium concentrations were prepared on glass substrates by direct current reactive magnetron sputtering. The results of the X-ray diffraction (XRD) show that the films with doping concentration less than 10 at.% have a wurtzite structure and grow mainly along the c-axis orientation. The residual stress, estimated by fitting the XRD diffraction peaks, increases with the doping concentration and the grain size also has been calculated from the XRD results, decreases with increasing the doping concentration. The surface morphology of the ZnO:V thin films was examined by SEM. The optical constants (refractive index and extinction coefficient) and the film thickness have been obtained by fitting the transmittance. The optical band gap changed from 3.12 eV to 3.60 eV as doping concentration increased from 1.8 at.% to 13 at.% mol. All the results have been discussed in relation with doping concentrationapplication/pdfporStructure and optical properties of ZnO:V thin films with different doping concentrationWang Li-WeiMeng LijianTeixeira, Vasco M. P.Song ShigengXu ZhengXu Xu-RongHostingInstitutionOrganizationalUniversidade do Minhoe-mailmailto:repositorium@usdb.uminho.ptrepositorium@usdb.uminho.ptISSNIsPartOf0040-6090DOIIsPartOf10.1016/j.tsf.2008.12.0432011-09-19T13:43:30Z2009-052008-012009-05-01T00:00:00ZHandlehttps://hdl.handle.net/1822/13627http://purl.org/coar/access_right/c_abf2open accessV-doped ZnOMagnetron sputteringOptical properties1227266 bytesliteraturehttp://purl.org/coar/resource_type/c_6501journal articlehttp://purl.org/coar/access_right/c_abf2application/pdffulltexthttps://prod-dspace.uminho.pt/bitstreams/0548ef8e-8bfb-4a39-b7dd-7692423f2dee/download
spellingShingle Structure and optical properties of ZnO:V thin films with different doping concentration
Wang Li-Wei
V-doped ZnO
Magnetron sputtering
Optical properties
status SINGLETON
subject.fl_str_mv V-doped ZnO
Magnetron sputtering
Optical properties
title Structure and optical properties of ZnO:V thin films with different doping concentration
title_full Structure and optical properties of ZnO:V thin films with different doping concentration
title_fullStr Structure and optical properties of ZnO:V thin films with different doping concentration
title_full_unstemmed Structure and optical properties of ZnO:V thin films with different doping concentration
title_short Structure and optical properties of ZnO:V thin films with different doping concentration
title_sort Structure and optical properties of ZnO:V thin films with different doping concentration
topic V-doped ZnO
Magnetron sputtering
Optical properties
topic_facet V-doped ZnO
Magnetron sputtering
Optical properties
url https://hdl.handle.net/1822/13627
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