Publicação
Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films
| Resumo: | Titanium films were DC sputtered with a particle flux incidence angle of 80 degrees, using the Glancing Angle Deposition (GLAD) technique with increasing sputtering pressures from 0.2 to 1.5 Pa. This range of pressures is typically implemented for the deposition of thin films by the magnetron sputtering process. The main objective of this work was to study the anisotropic electrical resistivity behaviour of the different thin film nanostructures that were obtained. It is shown that low sputtering pressures (0.2-0.5 Pa) promote higher column angles beta with respect to the substrate normal (15 degrees <= beta <= 40 degrees), as well as better defined porous structures. On the other hand, intermediate and high pressures (0.6-0.8 Pa) originate secondary growth effects on the columnar structures perpendicular to the substrate normal (beta = 0 degrees). No defined columns can be seen when the films are sputtered using the highest pressure (1.5 Pa). The electrical resistivity is significantly affected by the differences in the columnar microstructure. Porous films exhibit higher room temperature (RT) resistivity values (0.95-1.5 x 10-5 Omega m), when compared to the more compact ones (0.6-0.9 x 10(-5) Omega m). When a temperature cycle of RT(25)-300-RT(25)degrees C was applied, a more significant oxidation is evidenced in the more porous structures, as well as a higher resistivity anisotropy (maximum of 1.6) than in the more compact ones (minimum of 1.25). |
|---|---|
| Autores principais: | Pedrosa, Paulo Eduardo Teixeira Baptista |
| Outros Autores: | Ferreira, Armando José Barros; Cote, Jean-Marc; Martin, Nicolas; Yazdi, Mohammad Arab Pour; Billard, Alain; Lanceros-Méndez, S.; Vaz, F. |
| Assunto: | Glancing angle deposition Titanium Nanostructured films Anisotropy Electrical resistivity |
| Ano: | 2017 |
| País: | Portugal |
| Tipo de documento: | artigo |
| Tipo de acesso: | acesso restrito |
| Instituição associada: | Universidade do Minho |
| Idioma: | inglês |
| Origem: | RepositóriUM - Universidade do Minho |
| _version_ | 1866876935151288320 |
|---|---|
| author | Pedrosa, Paulo Eduardo Teixeira Baptista |
| author2 | Ferreira, Armando José Barros Cote, Jean-Marc Martin, Nicolas Yazdi, Mohammad Arab Pour Billard, Alain Lanceros-Méndez, S. Vaz, F. |
| author2_role | author author author author author author author |
| author_facet | Pedrosa, Paulo Eduardo Teixeira Baptista Ferreira, Armando José Barros Cote, Jean-Marc Martin, Nicolas Yazdi, Mohammad Arab Pour Billard, Alain Lanceros-Méndez, S. Vaz, F. |
| author_role | author |
| contributor_name_str_mv | Universidade do Minho |
| country_str | PT |
| creators_json_txt | [{\"Person.name\":\"Pedrosa, Paulo Eduardo Teixeira Baptista\"},{\"Person.name\":\"Ferreira, Armando José Barros\"},{\"Person.name\":\"Cote, Jean-Marc\"},{\"Person.name\":\"Martin, Nicolas\"},{\"Person.name\":\"Yazdi, Mohammad Arab Pour\"},{\"Person.name\":\"Billard, Alain\"},{\"Person.name\":\"Lanceros-Méndez, S.\"},{\"Person.name\":\"Vaz, F.\"}] |
| datacite.contributors.contributor.contributorName.fl_str_mv | Universidade do Minho |
| datacite.creators.creator.creatorName.fl_str_mv | Pedrosa, Paulo Eduardo Teixeira Baptista Ferreira, Armando José Barros Cote, Jean-Marc Martin, Nicolas Yazdi, Mohammad Arab Pour Billard, Alain Lanceros-Méndez, S. Vaz, F. |
| datacite.date.Accepted.fl_str_mv | 2017-01-01T00:00:00Z |
| datacite.rights.fl_str_mv | http://purl.org/coar/access_right/c_16ec |
| datacite.subjects.subject.fl_str_mv | Glancing angle deposition Titanium Nanostructured films Anisotropy Electrical resistivity |
| datacite.titles.title.fl_str_mv | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films |
| dc.contributor.none.fl_str_mv | Universidade do Minho |
| dc.creator.none.fl_str_mv | Pedrosa, Paulo Eduardo Teixeira Baptista Ferreira, Armando José Barros Cote, Jean-Marc Martin, Nicolas Yazdi, Mohammad Arab Pour Billard, Alain Lanceros-Méndez, S. Vaz, F. |
| dc.date.Accepted.fl_str_mv | 2017-01-01T00:00:00Z |
| dc.format.none.fl_str_mv | application/pdf |
| dc.identifier.none.fl_str_mv | https://hdl.handle.net/1822/52580 |
| dc.language.none.fl_str_mv | eng |
| dc.publisher.none.fl_str_mv | Elsevier Science |
| dc.rights.none.fl_str_mv | http://purl.org/coar/access_right/c_16ec |
| dc.subject.none.fl_str_mv | Glancing angle deposition Titanium Nanostructured films Anisotropy Electrical resistivity |
| dc.title.fl_str_mv | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films |
| dc.type.none.fl_str_mv | http://purl.org/coar/resource_type/c_6501 |
| description | Titanium films were DC sputtered with a particle flux incidence angle of 80 degrees, using the Glancing Angle Deposition (GLAD) technique with increasing sputtering pressures from 0.2 to 1.5 Pa. This range of pressures is typically implemented for the deposition of thin films by the magnetron sputtering process. The main objective of this work was to study the anisotropic electrical resistivity behaviour of the different thin film nanostructures that were obtained. It is shown that low sputtering pressures (0.2-0.5 Pa) promote higher column angles beta with respect to the substrate normal (15 degrees <= beta <= 40 degrees), as well as better defined porous structures. On the other hand, intermediate and high pressures (0.6-0.8 Pa) originate secondary growth effects on the columnar structures perpendicular to the substrate normal (beta = 0 degrees). No defined columns can be seen when the films are sputtered using the highest pressure (1.5 Pa). The electrical resistivity is significantly affected by the differences in the columnar microstructure. Porous films exhibit higher room temperature (RT) resistivity values (0.95-1.5 x 10-5 Omega m), when compared to the more compact ones (0.6-0.9 x 10(-5) Omega m). When a temperature cycle of RT(25)-300-RT(25)degrees C was applied, a more significant oxidation is evidenced in the more porous structures, as well as a higher resistivity anisotropy (maximum of 1.6) than in the more compact ones (minimum of 1.25). |
| dirty | 0 |
| eu_rights_str_mv | restrictedAccess |
| format | article |
| fulltext.url.fl_str_mv | https://prod-dspace.uminho.pt/bitstreams/2f4fe456-020d-4de3-b139-1c6cde990968/download |
| id | rum_fe9c4e4b0f95ab72ba2c68cf0a5a7ef1 |
| identifier.url.fl_str_mv | https://hdl.handle.net/1822/52580 |
| instacron_str | repositorium |
| institution | Universidade do Minho |
| instname_str | Universidade do Minho |
| language | eng |
| network_acronym_str | rum |
| network_name_str | RepositóriUM - Universidade do Minho |
| oai_identifier_str | oai:repositorium.uminho.pt:1822/52580 |
| organization_str_mv | urn:organizationAcronym:repositorium |
| person_str_mv | Pedrosa, Paulo Eduardo Teixeira Baptista Ferreira, Armando José Barros Cote, Jean-Marc Martin, Nicolas Yazdi, Mohammad Arab Pour Billard, Alain Lanceros-Méndez, S. Vaz, F. |
| publishDate | 2017 |
| publisher.none.fl_str_mv | Elsevier Science |
| reponame_str | RepositóriUM - Universidade do Minho |
| repository_id_str | urn:repositoryAcronym:rum |
| service_str_mv | urn:repositoryAcronym:rum |
| spelling | engElsevier ScienceporTitanium films were DC sputtered with a particle flux incidence angle of 80 degrees, using the Glancing Angle Deposition (GLAD) technique with increasing sputtering pressures from 0.2 to 1.5 Pa. This range of pressures is typically implemented for the deposition of thin films by the magnetron sputtering process. The main objective of this work was to study the anisotropic electrical resistivity behaviour of the different thin film nanostructures that were obtained. It is shown that low sputtering pressures (0.2-0.5 Pa) promote higher column angles beta with respect to the substrate normal (15 degrees <= beta <= 40 degrees), as well as better defined porous structures. On the other hand, intermediate and high pressures (0.6-0.8 Pa) originate secondary growth effects on the columnar structures perpendicular to the substrate normal (beta = 0 degrees). No defined columns can be seen when the films are sputtered using the highest pressure (1.5 Pa). The electrical resistivity is significantly affected by the differences in the columnar microstructure. Porous films exhibit higher room temperature (RT) resistivity values (0.95-1.5 x 10-5 Omega m), when compared to the more compact ones (0.6-0.9 x 10(-5) Omega m). When a temperature cycle of RT(25)-300-RT(25)degrees C was applied, a more significant oxidation is evidenced in the more porous structures, as well as a higher resistivity anisotropy (maximum of 1.6) than in the more compact ones (minimum of 1.25).application/pdfporInfluence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium filmsPedrosa, Paulo Eduardo Teixeira BaptistaFerreira, Armando José BarrosCote, Jean-MarcMartin, NicolasYazdi, Mohammad Arab PourBillard, AlainLanceros-Méndez, S.Vaz, F.HostingInstitutionOrganizationalUniversidade do Minhoe-mailmailto:repositorium@usdb.uminho.ptrepositorium@usdb.uminho.ptISSNIsPartOf0169-4332DOIIsPartOf10.1016/j.apsusc.2017.05.17520172018-03-13T10:43:38Z2017-01-01T00:00:00ZHandlehttps://hdl.handle.net/1822/52580http://purl.org/coar/access_right/c_16ecrestricted accessGlancing angle depositionTitaniumNanostructured filmsAnisotropyElectrical resistivity4707128 bytesliteraturehttp://purl.org/coar/resource_type/c_6501journal articlehttp://purl.org/coar/access_right/c_16ecapplication/pdffulltexthttps://prod-dspace.uminho.pt/bitstreams/2f4fe456-020d-4de3-b139-1c6cde990968/download |
| spellingShingle | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films Pedrosa, Paulo Eduardo Teixeira Baptista Glancing angle deposition Titanium Nanostructured films Anisotropy Electrical resistivity |
| status | SINGLETON |
| subject.fl_str_mv | Glancing angle deposition Titanium Nanostructured films Anisotropy Electrical resistivity |
| title | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films |
| title_full | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films |
| title_fullStr | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films |
| title_full_unstemmed | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films |
| title_short | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films |
| title_sort | Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films |
| topic | Glancing angle deposition Titanium Nanostructured films Anisotropy Electrical resistivity |
| topic_facet | Glancing angle deposition Titanium Nanostructured films Anisotropy Electrical resistivity |
| url | https://hdl.handle.net/1822/52580 |
| visible | 1 |