Publicação
Sputtering of silicon nanopowders by an argon cluster ion beam
| Resumo: | In this work an Ar + cluster ion beam with energy in the range of 10-70 keV and dose of 7.2 × 10 14 -2.3 × 10 16 cluster/cm 2 was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters (energy and dose) on the sputtering depth and sputtering yield was studied. The sputtering yield was found to decrease with increasing dose and target density. The energy dependence demonstrated an unusual non-monotonic behavior. At 17.3 keV a maximum of the sputtering yield was observed, which was more than forty times higher than that of the bulk Si. The surface roughness at low energy demonstrates a similar energy dependence with a maximum near 17 keV. The dose and energy dependence of the sputtering yield was explained by the competition of the finite size effect and the effect of debris formation. |
|---|---|
| Autores principais: | Zeng, Xiaomei |
| Outros Autores: | Pelenovich, Vasiliy; Wang, Zhenguo; Zuo, Wenbin; Belykh, Sergey; Tolstogouzov, Alexander; Fu, Dejun; Xiao, Xiangheng |
| Assunto: | Finite size effect Gas cluster ion beam Silicon nanoparticles Smoothing effect Sputtering General Materials Science General Physics and Astronomy Electrical and Electronic Engineering |
| Ano: | 2019 |
| País: | Portugal |
| Tipo de documento: | artigo |
| Tipo de acesso: | acesso aberto |
| Instituição associada: | Universidade Nova de Lisboa |
| Idioma: | inglês |
| Origem: | Repositório Institucional da UNL |
| _version_ | 1868983223801872384 |
|---|---|
| author | Zeng, Xiaomei |
| author2 | Pelenovich, Vasiliy Wang, Zhenguo Zuo, Wenbin Belykh, Sergey Tolstogouzov, Alexander Fu, Dejun Xiao, Xiangheng |
| author2_role | author author author author author author author |
| author_facet | Zeng, Xiaomei Pelenovich, Vasiliy Wang, Zhenguo Zuo, Wenbin Belykh, Sergey Tolstogouzov, Alexander Fu, Dejun Xiao, Xiangheng |
| author_role | author |
| contributor_name_str_mv | CeFITec – Centro de Física e Investigação Tecnológica DF – Departamento de Física Beilstein-Institut RUN |
| country_str | PT |
| creators_json_txt | [{\"Person.name\":\"Zeng, Xiaomei\"},{\"Person.name\":\"Pelenovich, Vasiliy\"},{\"Person.name\":\"Wang, Zhenguo\"},{\"Person.name\":\"Zuo, Wenbin\"},{\"Person.name\":\"Belykh, Sergey\"},{\"Person.name\":\"Tolstogouzov, Alexander\"},{\"Person.name\":\"Fu, Dejun\"},{\"Person.name\":\"Xiao, Xiangheng\"}] |
| datacite.contributors.contributor.contributorName.fl_str_mv | CeFITec – Centro de Física e Investigação Tecnológica DF – Departamento de Física Beilstein-Institut RUN |
| datacite.creators.creator.creatorName.fl_str_mv | Zeng, Xiaomei Pelenovich, Vasiliy Wang, Zhenguo Zuo, Wenbin Belykh, Sergey Tolstogouzov, Alexander Fu, Dejun Xiao, Xiangheng |
| datacite.date.Accepted.fl_str_mv | 2019-01-01T00:00:00Z |
| datacite.date.available.fl_str_mv | 2019-09-18T22:46:31Z |
| datacite.date.embargoed.fl_str_mv | 2019-09-18T22:46:31Z |
| datacite.rights.fl_str_mv | http://purl.org/coar/access_right/c_abf2 |
| datacite.subjects.subject.fl_str_mv | Finite size effect Gas cluster ion beam Silicon nanoparticles Smoothing effect Sputtering General Materials Science General Physics and Astronomy Electrical and Electronic Engineering |
| datacite.titles.title.fl_str_mv | Sputtering of silicon nanopowders by an argon cluster ion beam |
| dc.contributor.none.fl_str_mv | CeFITec – Centro de Física e Investigação Tecnológica DF – Departamento de Física Beilstein-Institut RUN |
| dc.creator.none.fl_str_mv | Zeng, Xiaomei Pelenovich, Vasiliy Wang, Zhenguo Zuo, Wenbin Belykh, Sergey Tolstogouzov, Alexander Fu, Dejun Xiao, Xiangheng |
| dc.date.Accepted.fl_str_mv | 2019-01-01T00:00:00Z |
| dc.date.available.fl_str_mv | 2019-09-18T22:46:31Z |
| dc.date.embargoed.fl_str_mv | 2019-09-18T22:46:31Z |
| dc.format.none.fl_str_mv | application/pdf |
| dc.identifier.none.fl_str_mv | http://www.scopus.com/inward/record.url?scp=85060154337&partnerID=8YFLogxK |
| dc.language.none.fl_str_mv | eng |
| dc.rights.none.fl_str_mv | http://purl.org/coar/access_right/c_abf2 |
| dc.subject.none.fl_str_mv | Finite size effect Gas cluster ion beam Silicon nanoparticles Smoothing effect Sputtering General Materials Science General Physics and Astronomy Electrical and Electronic Engineering |
| dc.title.fl_str_mv | Sputtering of silicon nanopowders by an argon cluster ion beam |
| dc.type.none.fl_str_mv | http://purl.org/coar/resource_type/c_6501 |
| description | In this work an Ar + cluster ion beam with energy in the range of 10-70 keV and dose of 7.2 × 10 14 -2.3 × 10 16 cluster/cm 2 was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters (energy and dose) on the sputtering depth and sputtering yield was studied. The sputtering yield was found to decrease with increasing dose and target density. The energy dependence demonstrated an unusual non-monotonic behavior. At 17.3 keV a maximum of the sputtering yield was observed, which was more than forty times higher than that of the bulk Si. The surface roughness at low energy demonstrates a similar energy dependence with a maximum near 17 keV. The dose and energy dependence of the sputtering yield was explained by the competition of the finite size effect and the effect of debris formation. |
| dirty | 0 |
| eu_rights_str_mv | openAccess |
| format | article |
| fulltext.url.fl_str_mv | https://run.unl.pt/bitstreams/1ac910ce-5715-47c0-b2ff-fc02453d6254/download |
| id | run_c8a9334b16c63c982b29ce0dfd4f4c55 |
| identifier.url.fl_str_mv | http://www.scopus.com/inward/record.url?scp=85060154337&partnerID=8YFLogxK |
| inst_facet_str | urn:organizationAcronym:unl{{{_:::_}}}Universidade Nova de Lisboa |
| instacron_str | unl |
| institution | Universidade Nova de Lisboa |
| instname_str | Universidade Nova de Lisboa |
| language | eng |
| network_acronym_str | run |
| network_name_str | Repositório Institucional da UNL |
| oai_identifier_str | oai:run.unl.pt:10362/81689 |
| organization_str_mv | urn:organizationAcronym:unl |
| person_str_mv | Zeng, Xiaomei Pelenovich, Vasiliy Wang, Zhenguo Zuo, Wenbin Belykh, Sergey Tolstogouzov, Alexander Fu, Dejun Xiao, Xiangheng |
| publishDate | 2019 |
| repo_facet_str | urn:repositoryAcronym:run{{{_:::_}}}Repositório Institucional da UNL |
| reponame_str | Repositório Institucional da UNL |
| repository_id_str | urn:repositoryAcronym:run |
| service_str_mv | urn:repositoryAcronym:run |
| spelling | engenIn this work an Ar + cluster ion beam with energy in the range of 10-70 keV and dose of 7.2 × 10 14 -2.3 × 10 16 cluster/cm 2 was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters (energy and dose) on the sputtering depth and sputtering yield was studied. The sputtering yield was found to decrease with increasing dose and target density. The energy dependence demonstrated an unusual non-monotonic behavior. At 17.3 keV a maximum of the sputtering yield was observed, which was more than forty times higher than that of the bulk Si. The surface roughness at low energy demonstrates a similar energy dependence with a maximum near 17 keV. The dose and energy dependence of the sputtering yield was explained by the competition of the finite size effect and the effect of debris formation.application/pdfenSputtering of silicon nanopowders by an argon cluster ion beamZeng, XiaomeiPelenovich, VasiliyWang, ZhenguoZuo, WenbinBelykh, SergeyTolstogouzov, AlexanderFu, DejunXiao, XianghengCeFITec – Centro de Física e Investigação TecnológicaDF – Departamento de FísicaBeilstein-InstitutHostingInstitutionOrganizationalRUNe-mailmailto:run@unl.ptrun@unl.ptISSNIsPartOf2190-4286URNIsPartOfPURE: 13379978URNIsPartOfPURE UUID: bceb293e-5980-46a5-a2ba-7a1b482bc73bURNIsPartOfScopus: 85060154337URNIsPartOfPubMed: 30680286URNIsPartOfPubMedCentral: PMC6334788URNIsPartOfWOS: :000455446000002DOIIsPartOf10.3762/bjnano.10.132019-09-18T22:46:31Z2019-01-012019-01-01T00:00:00ZURLhttp://www.scopus.com/inward/record.url?scp=85060154337&partnerID=8YFLogxKhttp://purl.org/coar/access_right/c_abf2open accessFinite size effectGas cluster ion beamSilicon nanoparticlesSmoothing effectSputteringGeneral Materials ScienceGeneral Physics and AstronomyElectrical and Electronic Engineering2113920 bytesliteraturehttp://purl.org/coar/resource_type/c_6501journal articlehttp://purl.org/coar/access_right/c_abf2application/pdffulltexthttps://run.unl.pt/bitstreams/1ac910ce-5715-47c0-b2ff-fc02453d6254/download |
| spellingShingle | Sputtering of silicon nanopowders by an argon cluster ion beam Zeng, Xiaomei Finite size effect Gas cluster ion beam Silicon nanoparticles Smoothing effect Sputtering General Materials Science General Physics and Astronomy Electrical and Electronic Engineering |
| status | SINGLETON |
| subject.fl_str_mv | Finite size effect Gas cluster ion beam Silicon nanoparticles Smoothing effect Sputtering General Materials Science General Physics and Astronomy Electrical and Electronic Engineering |
| title | Sputtering of silicon nanopowders by an argon cluster ion beam |
| title_full | Sputtering of silicon nanopowders by an argon cluster ion beam |
| title_fullStr | Sputtering of silicon nanopowders by an argon cluster ion beam |
| title_full_unstemmed | Sputtering of silicon nanopowders by an argon cluster ion beam |
| title_short | Sputtering of silicon nanopowders by an argon cluster ion beam |
| title_sort | Sputtering of silicon nanopowders by an argon cluster ion beam |
| topic | Finite size effect Gas cluster ion beam Silicon nanoparticles Smoothing effect Sputtering General Materials Science General Physics and Astronomy Electrical and Electronic Engineering |
| topic_facet | Finite size effect Gas cluster ion beam Silicon nanoparticles Smoothing effect Sputtering General Materials Science General Physics and Astronomy Electrical and Electronic Engineering |
| url | http://www.scopus.com/inward/record.url?scp=85060154337&partnerID=8YFLogxK |
| visible | 1 |