Citação norma APA

Amaral, A., Lavareda, G., Carvalho, C. N. d., André, V., Vygranenko, Y., Fernandes, M., & Brogueira, P. (2018). Etchability Dependence of InO x and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions.

Citação norma Chicago

Amaral, Ana, G. Lavareda, C. Nunes de Carvalho, V. André, Yuri Vygranenko, M. Fernandes, and Pedro Brogueira. Etchability Dependence of InO X and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions. 2018.

Citação norma MLA

Amaral, Ana, et al. Etchability Dependence of InO X and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions. 2018.

Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.