Publicação
Solution-based deposition of bare Au nanostructures onto H-terminated Si and wet-etching of Si wafers for optoelectronics
| Resumo: | In this work, we fabricated and studied wet chemically thinned Hterminated silicon substrates decorated with plasmonic AuNPs. The goal of this research was to pursue a deposition method that consistently generated AuNP submonolayer structures on an H-terminated silicon surface. Drop-casting, spin-coating and dip-coating deposition methods of AuNPs on both pristine and thinned silicon substrates were employed and compared. Thinned silicon substrates were produced via wet chemical (KOH) etching to thicknesses down to 50 m. The AuNPs were produced via pulsed laser ablation in liquid (PLAL) and span in the <50 nm range. The dip-coating method yielded the most consistent and reproducible AuNP submonolayer formations. Both H₂O and THF were used and studied as solvents for the AuNP depositions. THF-based solutions produced spread out and uniform depositions. Dip-coating depositions using a THF-based solution synthesised under PLAL for 90 minutes yielded the highest surface coverage (38%) of all the deposition methods studied. |
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| Autores principais: | Bruno, Dinis Pinto Rosa |
| Assunto: | Wet chemical etching H-termination PLAL Gold nanoparticle Plasmonics |
| Ano: | 2022 |
| País: | Portugal |
| Tipo de documento: | dissertação de mestrado |
| Tipo de acesso: | acesso aberto |
| Instituição associada: | Universidade de Aveiro |
| Idioma: | inglês |
| Origem: | RIA - Repositório Institucional da Universidade de Aveiro |
| Resumo: | In this work, we fabricated and studied wet chemically thinned Hterminated silicon substrates decorated with plasmonic AuNPs. The goal of this research was to pursue a deposition method that consistently generated AuNP submonolayer structures on an H-terminated silicon surface. Drop-casting, spin-coating and dip-coating deposition methods of AuNPs on both pristine and thinned silicon substrates were employed and compared. Thinned silicon substrates were produced via wet chemical (KOH) etching to thicknesses down to 50 m. The AuNPs were produced via pulsed laser ablation in liquid (PLAL) and span in the <50 nm range. The dip-coating method yielded the most consistent and reproducible AuNP submonolayer formations. Both H₂O and THF were used and studied as solvents for the AuNP depositions. THF-based solutions produced spread out and uniform depositions. Dip-coating depositions using a THF-based solution synthesised under PLAL for 90 minutes yielded the highest surface coverage (38%) of all the deposition methods studied. |
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