Detalhes bibliográficos
| Resumo: | Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering and their chemical properties, biofilm formation and toxicity were characterized. Based on the films composition three different growth regimes were identified on the films; (I) N/Ti = 2.11 (high atomic ratio) and low oxygen content; (II) 0.77 ≤ N/Ti ≤ 1.86 (intermediate atomic ratio) and (III) N/Ti ≤ 0.12 (low ratio) and high oxygen content. The phase composition varied from mainly TiN on regime I to TiCN on regime 2 and titanium oxides on regime III. Taking into account the results of biological characterization (biofilm formation and cytotoxicity), it was possible to conclude that samples with a high TiN content (regime I) presented more favorable biocompatibility, since it was less prone to microbial colonization and also displayed a low cytotoxicity. |
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| Autores principais: | Oliveira, C. |
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| Outros Autores: | Escobar Galindo, R.; Palacio, C.; Velasco, Sebastian Calderon; Almeida, B. G.; Henriques, Mariana; Espinosa, A.; Carvalho, S. |
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| Assunto: | Sputtering GDOES Raman XPS |
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| Ano: | 2011 |
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| País: | Portugal |
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| Tipo de documento: | artigo |
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| Tipo de acesso: | acesso aberto |
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| Instituição associada: | Universidade do Minho |
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| Idioma: | inglês |
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| Origem: | RepositóriUM - Universidade do Minho |
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