Publicação
Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films
| Resumo: | This work reports thermal annealing induced effect on the structural, optical, chemical and ferroelectric properties of ion-beam sputtered lead-free ferroelectric 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ (0.5BZT–0.5BCT) thin films. X-ray diffraction studies reveal that the tetragonality increases with the annealing temperature (Ta), while photoluminescence and X-ray photoelectron spectroscopy studies confirm that this effect is associated with the annihilation of the oxygen vacancies as well as changes in the Ba2+ coordination. The films annealed at 750 °C show a remarkable remnant polarization of Pr = 45.0 μC/cm2, with a coercive field of 32 kV/cm. The temperature dependence of the spontaneous polarization of the 0.5BZT–0.5BCT film reveals a mean field behavior of the polarization and the fatigue study reveals that Pr only decreases 3% after passing 109 cycles. Therefore the high remnant polarization and its high Pr stability make these films as promising candidates for memory applications |
|---|---|
| Autores principais: | Oliveira, M. J. S. |
| Outros Autores: | Silva, J. P. B.; Veltruská, K.; Matolín, V.; Sekhar, K. C.; Moreira, J. Agostinho; Pereira, M.; Gomes, M. J. M. |
| Assunto: | Fatigue characteristics (0.5BZT–0.5BCT) thin film Ion-beam sputtering deposition X-ray photoelectron spectroscopy Ion-beam sputtering deposition technique Ciências Naturais::Ciências Físicas |
| Ano: | 2018 |
| País: | Portugal |
| Tipo de documento: | artigo |
| Tipo de acesso: | acesso restrito |
| Instituição associada: | Universidade do Minho |
| Idioma: | inglês |
| Origem: | RepositóriUM - Universidade do Minho |
| _version_ | 1867438146169339904 |
|---|---|
| author | Oliveira, M. J. S. |
| author2 | Silva, J. P. B. Veltruská, K. Matolín, V. Sekhar, K. C. Moreira, J. Agostinho Pereira, M. Gomes, M. J. M. |
| author2_role | author author author author author author author |
| author_facet | Oliveira, M. J. S. Silva, J. P. B. Veltruská, K. Matolín, V. Sekhar, K. C. Moreira, J. Agostinho Pereira, M. Gomes, M. J. M. |
| author_role | author |
| contributor_name_str_mv | RepositóriUM - Universidade do Minho |
| country_str | PT |
| creators_json_txt | [{\"Person.name\":\"Oliveira, M. J. S.\"},{\"Person.name\":\"Silva, J. P. B.\"},{\"Person.name\":\"Veltruská, K.\"},{\"Person.name\":\"Matolín, V.\"},{\"Person.name\":\"Sekhar, K. C.\"},{\"Person.name\":\"Moreira, J. Agostinho\"},{\"Person.name\":\"Pereira, M.\"},{\"Person.name\":\"Gomes, M. J. M.\"}] |
| datacite.contributors.contributor.contributorName.fl_str_mv | RepositóriUM - Universidade do Minho |
| datacite.creators.creator.creatorName.fl_str_mv | Oliveira, M. J. S. Silva, J. P. B. Veltruská, K. Matolín, V. Sekhar, K. C. Moreira, J. Agostinho Pereira, M. Gomes, M. J. M. |
| datacite.date.Accepted.fl_str_mv | 2018-06-01T00:00:00Z |
| datacite.rights.fl_str_mv | http://purl.org/coar/access_right/c_16ec |
| datacite.subjects.subject.fl_str_mv | Fatigue characteristics (0.5BZT–0.5BCT) thin film Ion-beam sputtering deposition X-ray photoelectron spectroscopy Ion-beam sputtering deposition technique Ciências Naturais::Ciências Físicas |
| datacite.titles.title.fl_str_mv | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films |
| dc.contributor.none.fl_str_mv | RepositóriUM - Universidade do Minho |
| dc.creator.none.fl_str_mv | Oliveira, M. J. S. Silva, J. P. B. Veltruská, K. Matolín, V. Sekhar, K. C. Moreira, J. Agostinho Pereira, M. Gomes, M. J. M. |
| dc.date.Accepted.fl_str_mv | 2018-06-01T00:00:00Z |
| dc.format.none.fl_str_mv | application/pdf |
| dc.identifier.none.fl_str_mv | https://hdl.handle.net/1822/57402 |
| dc.language.none.fl_str_mv | eng |
| dc.publisher.none.fl_str_mv | Elsevier |
| dc.rights.none.fl_str_mv | http://purl.org/coar/access_right/c_16ec |
| dc.subject.none.fl_str_mv | Fatigue characteristics (0.5BZT–0.5BCT) thin film Ion-beam sputtering deposition X-ray photoelectron spectroscopy Ion-beam sputtering deposition technique Ciências Naturais::Ciências Físicas |
| dc.title.fl_str_mv | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films |
| dc.type.none.fl_str_mv | http://purl.org/coar/resource_type/c_6501 |
| description | This work reports thermal annealing induced effect on the structural, optical, chemical and ferroelectric properties of ion-beam sputtered lead-free ferroelectric 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ (0.5BZT–0.5BCT) thin films. X-ray diffraction studies reveal that the tetragonality increases with the annealing temperature (Ta), while photoluminescence and X-ray photoelectron spectroscopy studies confirm that this effect is associated with the annihilation of the oxygen vacancies as well as changes in the Ba2+ coordination. The films annealed at 750 °C show a remarkable remnant polarization of Pr = 45.0 μC/cm2, with a coercive field of 32 kV/cm. The temperature dependence of the spontaneous polarization of the 0.5BZT–0.5BCT film reveals a mean field behavior of the polarization and the fatigue study reveals that Pr only decreases 3% after passing 109 cycles. Therefore the high remnant polarization and its high Pr stability make these films as promising candidates for memory applications |
| dirty | 0 |
| eu_rights_str_mv | restrictedAccess |
| format | article |
| fulltext.url.fl_str_mv | https://repositorium.uminho.pt/bitstreams/94a33085-4d5a-4a77-8c25-d9a1a585878c/download |
| id | rum_8f4d4f694cf6bc2dc2bafa6280febf7c |
| identifier.url.fl_str_mv | https://hdl.handle.net/1822/57402 |
| instacron_str | repositorium |
| institution | Universidade do Minho |
| instname_str | Universidade do Minho |
| language | eng |
| network_acronym_str | rum |
| network_name_str | RepositóriUM - Universidade do Minho |
| oai_identifier_str | oai:repositorium.uminho.pt:1822/57402 |
| organization_str_mv | urn:organizationAcronym:repositorium |
| person_str_mv | Oliveira, M. J. S. Silva, J. P. B. Veltruská, K. Matolín, V. Sekhar, K. C. Moreira, J. Agostinho Pereira, M. Gomes, M. J. M. |
| publishDate | 2018 |
| publisher.none.fl_str_mv | Elsevier |
| reponame_str | RepositóriUM - Universidade do Minho |
| repository_id_str | urn:repositoryAcronym:rum |
| service_str_mv | urn:repositoryAcronym:rum |
| spelling | engElsevierporThis work reports thermal annealing induced effect on the structural, optical, chemical and ferroelectric properties of ion-beam sputtered lead-free ferroelectric 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ (0.5BZT–0.5BCT) thin films. X-ray diffraction studies reveal that the tetragonality increases with the annealing temperature (Ta), while photoluminescence and X-ray photoelectron spectroscopy studies confirm that this effect is associated with the annihilation of the oxygen vacancies as well as changes in the Ba2+ coordination. The films annealed at 750 °C show a remarkable remnant polarization of Pr = 45.0 μC/cm2, with a coercive field of 32 kV/cm. The temperature dependence of the spontaneous polarization of the 0.5BZT–0.5BCT film reveals a mean field behavior of the polarization and the fatigue study reveals that Pr only decreases 3% after passing 109 cycles. Therefore the high remnant polarization and its high Pr stability make these films as promising candidates for memory applicationsapplication/pdfporAnnealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin filmsOliveira, M. J. S.Silva, J. P. B.Veltruská, K.Matolín, V.Sekhar, K. C.Moreira, J. AgostinhoPereira, M.Gomes, M. J. M.HostingInstitutionOrganizationalRepositóriUM - Universidade do Minhoe-mailmailto:repositorium@usdb.uminho.ptrepositorium@usdb.uminho.ptCITATIONOliveira, M. J. S., Silva, J. P. B., Veltruska, K., Matolín, V., Sekhar, K. C., Agostinho Moreira, J., ... & Gomes, M. J. M. (2018). Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba (Zr0. 2Ti0. 8) O-3-0.5 (Ba0. 7Ca0. 3) TiO3-delta ferroelectric thin films. APPLIED SURFACE SCIENCE, 443, 354-360ISSNIsPartOf0169-4332DOIIsPartOf10.1016/j.apsusc.2018.02.2692018-062017-122018-06-01T00:00:00ZHandlehttps://hdl.handle.net/1822/57402http://purl.org/coar/access_right/c_16ecrestricted accessFatigue characteristics(0.5BZT–0.5BCT) thin filmIon-beam sputtering depositionX-ray photoelectron spectroscopyIon-beam sputtering deposition techniquehttp://www.oecd.org/science/inno/38235147.pdfFields of Science and Technology (FOS)Ciências Naturais::Ciências Físicas2144871 bytesliteraturehttp://purl.org/coar/resource_type/c_6501journal articleapplication/pdffulltexthttps://repositorium.uminho.pt/bitstreams/94a33085-4d5a-4a77-8c25-d9a1a585878c/download |
| spellingShingle | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films Oliveira, M. J. S. Fatigue characteristics (0.5BZT–0.5BCT) thin film Ion-beam sputtering deposition X-ray photoelectron spectroscopy Ion-beam sputtering deposition technique Ciências Naturais::Ciências Físicas |
| status | SINGLETON |
| subject.fl_str_mv | Fatigue characteristics (0.5BZT–0.5BCT) thin film Ion-beam sputtering deposition X-ray photoelectron spectroscopy Ion-beam sputtering deposition technique |
| subject.other.fl_str_mv | Ciências Naturais::Ciências Físicas |
| title | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films |
| title_full | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films |
| title_fullStr | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films |
| title_full_unstemmed | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films |
| title_short | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films |
| title_sort | Annealing induced effect on the physical properties of ion-beam sputtered 0.5 Ba(Zr0.2Ti0.8)O3 – 0.5 (Ba0.7Ca0.3)TiO3-δ ferroelectric thin films |
| topic | Fatigue characteristics (0.5BZT–0.5BCT) thin film Ion-beam sputtering deposition X-ray photoelectron spectroscopy Ion-beam sputtering deposition technique Ciências Naturais::Ciências Físicas |
| topic_facet | Fatigue characteristics (0.5BZT–0.5BCT) thin film Ion-beam sputtering deposition X-ray photoelectron spectroscopy Ion-beam sputtering deposition technique Ciências Naturais::Ciências Físicas |
| url | https://hdl.handle.net/1822/57402 |
| visible | 1 |