Publicação
Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering
| Resumo: | Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters |
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| Autores principais: | Thaiyalnayaki, V. |
| Outros Autores: | Cerqueira, M. F.; Macedo, Francisco; Ferreira, J. A. |
| Assunto: | Nanocrystalline silicon Thermal properties Structure |
| Ano: | 2006 |
| País: | Portugal |
| Tipo de documento: | comunicação em conferência |
| Tipo de acesso: | acesso aberto |
| Instituição associada: | Universidade do Minho |
| Idioma: | inglês |
| Origem: | RepositóriUM - Universidade do Minho |
| Resumo: | Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters |
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