Publicação
Electrochemical Characterization of the Influence of Scanning Number on the Self-assembled Monolayer Formed by Schiff Base
| Resumo: | The influence of potential-scan number on the Schiff base self-assembled monolayer was probed by the Cyclic Voltammetry (CV) and Electrochemical Impedance Spectroscopy (EIS) techniques for the first time. The results showed that the charge transferring resistance (Rct) could be reduced with the potential-scan, suggesting that the structure of the self-assembled monolayer was altered. Also, the relationship between the content of C=N group, represented approximately by the reduction electric charge (Qr), and the monolayers packing degree which was represented by the value of Rct, was described. Providing a new way to change the interface characterization is the main contribution of this paper. |
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| Autores principais: | Ding,K. |
| Outros Autores: | Wang,Q.; Jia,Z.; Tong,R.; Wang,X. |
| Assunto: | number influence self-assembled monolayers Schiff |
| Ano: | 2003 |
| País: | Portugal |
| Tipo de documento: | artigo |
| Tipo de acesso: | acesso aberto |
| Instituição associada: | Fundação para a Ciência e Tecnologia |
| Idioma: | inglês |
| Origem: | SciELO Portugal |
| Resumo: | The influence of potential-scan number on the Schiff base self-assembled monolayer was probed by the Cyclic Voltammetry (CV) and Electrochemical Impedance Spectroscopy (EIS) techniques for the first time. The results showed that the charge transferring resistance (Rct) could be reduced with the potential-scan, suggesting that the structure of the self-assembled monolayer was altered. Also, the relationship between the content of C=N group, represented approximately by the reduction electric charge (Qr), and the monolayers packing degree which was represented by the value of Rct, was described. Providing a new way to change the interface characterization is the main contribution of this paper. |
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