Publicação

Electrochemical Characterization of the Influence of Scanning Number on the Self-assembled Monolayer Formed by Schiff Base

Ver documento

Detalhes bibliográficos
Resumo:The influence of potential-scan number on the Schiff base self-assembled monolayer was probed by the Cyclic Voltammetry (CV) and Electrochemical Impedance Spectroscopy (EIS) techniques for the first time. The results showed that the charge transferring resistance (Rct) could be reduced with the potential-scan, suggesting that the structure of the self-assembled monolayer was altered. Also, the relationship between the content of C=N group, represented approximately by the reduction electric charge (Qr), and the monolayer’s packing degree which was represented by the value of Rct, was described. Providing a new way to change the interface characterization is the main contribution of this paper.
Autores principais:Ding,K.
Outros Autores:Wang,Q.; Jia,Z.; Tong,R.; Wang,X.
Assunto:number influence self-assembled monolayers Schiff
Ano:2003
País:Portugal
Tipo de documento:artigo
Tipo de acesso:acesso aberto
Instituição associada:Fundação para a Ciência e Tecnologia
Idioma:inglês
Origem:SciELO Portugal

Registos relacionados

Registos relacionados